\contentsline {chapter}{\numberline {1}Introduction}{1}
\contentsline {chapter}{\numberline {2}Choice of technique}{3}
\contentsline {section}{\numberline {2.1}Compton back-scatter}{3}
\contentsline {section}{\numberline {2.2}Tagged bremsstrahlung}{6}
\contentsline {section}{\numberline {2.3}Coherent bremsstrahlung}{7}
\contentsline {chapter}{\numberline {3}Photon source}{11}
\contentsline {section}{\numberline {3.1}Essential features}{12}
\contentsline {section}{\numberline {3.2}Use of collimation}{14}
\contentsline {section}{\numberline {3.3}Choice of radiator}{23}
\contentsline {section}{\numberline {3.4}Crystal quality}{25}
\contentsline {section}{\numberline {3.5}Crystal thickness}{31}
\contentsline {section}{\numberline {3.6}Crystal mount}{33}
\contentsline {section}{\numberline {3.7}Crystal alignment and monitoring}{35}
\contentsline {section}{\numberline {3.8}Crystal lifetime}{36}
\contentsline {chapter}{\numberline {4}Electron beam}{39}
\contentsline {section}{\numberline {4.1}Beam polarization}{39}
\contentsline {section}{\numberline {4.2}Beam emittance}{41}
\contentsline {section}{\numberline {4.3}Electron beam line optics}{44}
\contentsline {section}{\numberline {4.4}Electron beam dump}{47}
\contentsline {section}{\numberline {4.5}Beam containment and shielding}{47}
\contentsline {chapter}{\numberline {5}Tagging spectrometer}{51}
\contentsline {section}{\numberline {5.1}Specifications}{51}
\contentsline {section}{\numberline {5.2}Magnet}{52}
\contentsline {section}{\numberline {5.3}Spectrometer optics}{54}
\contentsline {section}{\numberline {5.4}Tagger detectors}{56}
\contentsline {subsection}{\numberline {5.4.1}Focal plane microscope detectors}{56}
\contentsline {subsection}{\numberline {5.4.2}Fixed focal plane array}{56}
\contentsline {section}{\numberline {5.5}Beam dump optics}{57}
\contentsline {chapter}{\numberline {6}Polarimetry instrumentation}{59}
\contentsline {chapter}{\numberline {7}Operating beam intensity}{63}